JPH0431104B2 - - Google Patents

Info

Publication number
JPH0431104B2
JPH0431104B2 JP58242570A JP24257083A JPH0431104B2 JP H0431104 B2 JPH0431104 B2 JP H0431104B2 JP 58242570 A JP58242570 A JP 58242570A JP 24257083 A JP24257083 A JP 24257083A JP H0431104 B2 JPH0431104 B2 JP H0431104B2
Authority
JP
Japan
Prior art keywords
naphthoquinone
diazide
photosensitive
compound
sulfonyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58242570A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60133446A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP24257083A priority Critical patent/JPS60133446A/ja
Publication of JPS60133446A publication Critical patent/JPS60133446A/ja
Publication of JPH0431104B2 publication Critical patent/JPH0431104B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP24257083A 1983-12-22 1983-12-22 感光性組成物 Granted JPS60133446A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24257083A JPS60133446A (ja) 1983-12-22 1983-12-22 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24257083A JPS60133446A (ja) 1983-12-22 1983-12-22 感光性組成物

Publications (2)

Publication Number Publication Date
JPS60133446A JPS60133446A (ja) 1985-07-16
JPH0431104B2 true JPH0431104B2 (en]) 1992-05-25

Family

ID=17091036

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24257083A Granted JPS60133446A (ja) 1983-12-22 1983-12-22 感光性組成物

Country Status (1)

Country Link
JP (1) JPS60133446A (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0713143A2 (en) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
EP0780730A2 (en) 1995-12-22 1997-06-25 Fuji Photo Film Co., Ltd. Positive-type light-sensitive lithographic printing plate

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60143345A (ja) * 1983-12-30 1985-07-29 Konishiroku Photo Ind Co Ltd ポジ型平版印刷版材料
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
DE3784549D1 (de) * 1986-05-02 1993-04-15 Hoechst Celanese Corp Positiv-arbeitendes lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial.
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
JP2618947B2 (ja) * 1988-01-08 1997-06-11 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP2639741B2 (ja) * 1990-05-02 1997-08-13 富士写真フイルム株式会社 感光性組成物
JPH0468355A (ja) * 1990-07-09 1992-03-04 Fuji Photo Film Co Ltd ポジ型感光性組成物
US5362599A (en) * 1991-11-14 1994-11-08 International Business Machines Corporations Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
JP4068253B2 (ja) * 1999-01-27 2008-03-26 Ａｚエレクトロニックマテリアルズ株式会社 ポジ型感光性樹脂組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817112A (ja) * 1981-06-22 1983-02-01 フイリツプ・エイ・ハント・ケミカル・コ−ポレイシヨン ポジ型ノボラツクホトレジスト組成物及びその調製物
AU9012082A (en) * 1981-11-06 1983-05-12 Polychrome Corp. Light sensitive composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0713143A2 (en) 1994-11-18 1996-05-22 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
EP0780730A2 (en) 1995-12-22 1997-06-25 Fuji Photo Film Co., Ltd. Positive-type light-sensitive lithographic printing plate

Also Published As

Publication number Publication date
JPS60133446A (ja) 1985-07-16

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